CHARACTERIZATION OF BORON-IMPLANTED, LASER-ANNEALED SILICON

被引：0
|
作者：
YOUNG, RT
WHITE, CW
NARAYAN, J
CLARK, GJ
CHRISTIE, WH
机构：
[1] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37830
[2] OAK RIDGE NATL LAB,DIV ANALYT CHEM,OAK RIDGE,TN 37830
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C138 / C138
页数：1
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