EFFECTS OF DEPOSITION PARAMETERS AND OXYGEN ADDITION ON PROPERTIES OF SPUTTERED INDIUM TIN OXIDE FILMS

被引：0
|
作者：
Munir, Badrul [1 ]
Wibowo, Rachmat Adhi [2 ]
Ho, Kim Kyoo [2 ]
机构：
[1] Univ Indonesia, Dept Met & Mat Engn, Depok 16424, Indonesia
[2] Yeungnam Univ, Sch Mat Sci & Engn, Gyongsan 712749, South Korea
来源：
MAKARA JOURNAL OF TECHNOLOGY | 2012年 / 16卷 / 02期
关键词：
characterization; indium semiconductor; sputtering; thin films; tin oxide;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Indium tin oxide (ITO) films were sputtered on corning glass substrate. Oxygen admixture and sputtering deposition parameters were optimized to obtain the highest transparency as well as lowest resistivity. Structural, electrical and optical properties of the films were then examined. Increasing deposition rate and film thickness changed the crystallographic orientation from (222) to (400) and (440), as well as higher surface roughness. It was necessary to apply substrate heating during reposition to get films with better crystallinity The lowest resistivity of 5.36 x 10(-4) Omega.cm was obtained at 750 nm film thickness. The films' resistivity was increased by addition of oxygen up to 2% in the argon sputtering gas. All films showed over 85% transmittance in the visible wavelength range, possible for applications in photovoltaic and display devices.
引用
收藏
页码：103 / 108
页数：6
相关论文
共 50 条
  • [41] Elastic properties of indium tin oxide films
    Wittkowski, T
    Jorzick, J
    Seitz, H
    Schröder, B
    Jung, K
    Hillebrands, B
    THIN SOLID FILMS, 2001, 398 : 465 - 470
  • [42] The effects of oxygen content on electrical and optical properties of indium tin oxide films fabricated by reactive sputtering
    Honda, S
    Watamori, M
    Oura, K
    THIN SOLID FILMS, 1996, 281 : 206 - 208
  • [43] EFFECTS OF OXYGEN ASHING ON INDIUM-TIN OXIDE THIN-FILMS
    DE, BN
    ZHAO, Y
    SNYDER, PG
    WOOLLAM, JA
    COUTTS, TJ
    LI, X
    SURFACE & COATINGS TECHNOLOGY, 1989, 39 (1-3): : 647 - 653
  • [44] Influence of the deposition parameters on the physical properties of tin oxide thin films
    DiGiulio, M
    Serra, A
    Tepore, A
    Rella, R
    Siciliano, P
    Mirenghi, L
    ADVANCES IN CRYSTAL GROWTH, 1996, 203 : 143 - 147
  • [45] Structural, optical and electrical properties of DC sputtered indium saving indium-tin oxide (ITO) thin films
    Voisin, Leandro
    Ohtsuka, Makoto
    Petrovska, Svitlana
    Sergiienko, Ruslan
    Nakamura, Takashi
    OPTIK, 2018, 156 : 728 - 737
  • [46] Preparation and characterization of indium tin oxide films formed by oxygen ion beam assisted deposition
    Liu, C
    Mihara, T
    Matsutani, T
    Asanuma, T
    Kiuchi, M
    SOLID STATE COMMUNICATIONS, 2003, 126 (09) : 509 - 513
  • [47] Structural Properties of Indium Tin Oxide Thin Films by Glancing Angle Deposition Method
    Oh, Gyujin
    Kim, Seon Pil
    Lee, Kyoung Su
    Kim, Eun Kyu
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2013, 13 (10) : 7149 - 7151
  • [48] Effects of deposition parameters on the electrical and mechanical properties of indium tin oxide films on polyethylene napthalate substrates deposited by radio frequency magnetron sputtering
    Bhagat, S. K.
    Han, H.
    Zoo, Y.
    Lewis, J.
    Grego, S.
    Lee, K.
    Iyer, S.
    Alford, T. L.
    THIN SOLID FILMS, 2008, 516 (12) : 4064 - 4069
  • [49] PROPERTIES OF INDIUM TIN OXIDE-FILMS PREPARED BY ION-ASSISTED DEPOSITION
    MARTIN, PJ
    NETTERFIELD, RP
    MCKENZIE, DR
    THIN SOLID FILMS, 1986, 137 (02) : 207 - 214
  • [50] Electrical and structural properties of indium tin oxide films prepared by pulsed laser deposition
    Izumi, H
    Adurodija, FO
    Kaneyoshi, T
    Ishihara, T
    Yoshioka, H
    Motoyama, M
    JOURNAL OF APPLIED PHYSICS, 2002, 91 (03) : 1213 - 1218
12345