POSTDEPOSITION ANNEALING EFFECTS IN RF REACTIVE MAGNETRON SPUTTERED INDIUM TIN OXIDE THIN-FILMS

被引：26
|
作者：
MARTINEZ, MA
HERRERO, J
GUTIERREZ, MT
机构：
[1] Instituto de Energías Renovables (CIEMAT), 28040 Madrid
来源：
SOLAR ENERGY MATERIALS AND SOLAR CELLS | 1992年 / 26卷 / 04期
关键词：
D O I：
10.1016/0927-0248(92)90050-Y
中图分类号：
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号：
0807 ; 0820 ;
摘要：
Indium tin oxide films have been grown by RF reactive magnetron sputtering. The influence of the deposition parameters on the properties of the films has been investigated and optimized, obtaining a value for the figure of merit of 6700 (OMEGA-cm)-1. As-grown indium tin oxide films were annealed in vacuum and O2 atmosphere. After these heat treatments the electro-optical properties were improved, with values for the resistivity of 1.9 X 10(-4)-OMEGA-cm and the figure of merit of 26700 (OMEGA-cm)-1.
引用
收藏
页码：309 / 321
页数：13
相关论文
共 50 条
  • [1] POSTDEPOSITION ANNEALING EFFECTS IN ELECTRON-BEAM-EVAPORATED INDIUM TIN OXIDE THIN-FILMS
    KROKOSZINSKI, HJ
    OESTERLEIN, R
    [J]. THIN SOLID FILMS, 1990, 187 (01) : 179 - 186
  • [2] THE GROWTH AND STRUCTURE OF RF SPUTTERED INDIUM TIN OXIDE THIN-FILMS
    SREENIVAS, K
    MANSINGH, A
    [J]. APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY): : 670 - 680
  • [3] THE EFFECTS OF POSTDEPOSITION ANNEALING ON THE MICROSTRUCTURE OF ELECTRON-BEAM EVAPORATED INDIUM TIN OXIDE THIN-FILMS
    DINIZ, ASAC
    KIELY, CJ
    ELFALLAL, I
    PILKINGTON, RD
    HILL, AE
    [J]. RENEWABLE ENERGY, 1994, 5 (1-4) : 209 - 211
  • [4] Investigations on the crystallisation properties of RF magnetron sputtered indium tin oxide thin films
    Thilakan, P
    Minarini, C
    Loreti, S
    Terzini, E
    [J]. THIN SOLID FILMS, 2001, 388 (1-2) : 34 - 40
  • [5] RF magnetron sputtered indium tin oxide thin films for application in solar cells
    Chu, J. B.
    Zhu, H. B.
    Xu, X. B.
    Sun, Z.
    Chen, Y. W.
    Huang, S. M.
    [J]. 2008 2ND IEEE INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1-3, 2008, : 728 - 731
  • [6] Properties of RF magnetron sputtered cadmium-tin-oxide and indium-tin-oxide thin films
    Wohlmuth, W
    Adesida, I
    [J]. THIN SOLID FILMS, 2005, 479 (1-2) : 223 - 231
  • [7] Etching of rf magnetron-sputtered indium tin oxide films
    Chiou, BS
    Lee, JH
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1996, 7 (03) : 241 - 246
  • [8] Mechanical properties of rf magnetron sputtered indium tin oxide films
    Wu, WF
    Chiou, BS
    [J]. THIN SOLID FILMS, 1997, 293 (1-2) : 244 - 250
  • [9] Annealing effects on properties of antimony tin oxide thin films deposited by RF reactive magnetron sputtering
    Huang, JL
    Pan, Y
    Chang, JY
    Yau, BS
    [J]. SURFACE & COATINGS TECHNOLOGY, 2004, 184 (2-3): : 188 - 193
  • [10] POSTDEPOSITION ANNEALING INFLUENCE ON SPUTTERED INDIUM TIN OXIDE FILM CHARACTERISTICS
    HIGUCHI, M
    UEKUSA, S
    NAKANO, R
    YOKOGAWA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1A): : 302 - 306
12345