ABERRATION CALCULATION FOR COMBINED MAGNETIC FOCUSING DEFLECTION SYSTEMS WITH CURVED AXES

被引：1
|
作者：
XIMEN, JY [1 ]
LIU, ZX [1 ]
机构：
[1] BEIJING UNIV, DEPT RADIO ELECTR, BEIJING 100871, PEOPLES R CHINA
来源：
JOURNAL OF APPLIED PHYSICS | 1993年 / 73卷 / 04期
关键词：
D O I：
10.1063/1.353237
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The general aberration theory for combined electromagnetic focusing-deflection systems with curved axes will be applied to a scanning electron microscopic system and an electron lithographic system. All third order geometric and first order chromatic aberrations have been calculated along rectilinear/curvilinear axes. The important identities between some aberration coefficients will be verified numerically. The geometric and chromatic aberrations calculated along the matching curvilinear axis will be compared with those along the rectilinear axis. The computational trials may be of help for explaining the mechanism of moving/swinging objective lens and variable axis lens systems.
引用
收藏
页码：1570 / 1575
页数：6
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