TAPERED WINDOWS IN SIO2 BY ION-IMPLANTATION

被引：23

|

作者：

MOLINE, RA

BUCKLEY, RR

HASZKO, SE

MACRAE, AU

机构：

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1973年 / ED20卷 / 09期

关键词：

D O I：

10.1109/T-ED.1973.17753

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：840 / 840

页数：1

相关论文

共 50 条

[21] IMPURITY GETTERING OF SILICON DAMAGE GENERATED BY ION-IMPLANTATION THROUGH SIO2 LAYERS
BEYER, KD
YEH, TH
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (11) : 2527 - 2530
[22] FORMATION OF TIN PHASE IN SIO2 AND SI THROUGH ION-IMPLANTATION OF CONSTITUENT ELEMENTS
RAI, AK
BHATTACHARYA, RS
KUNG, SC
MATERIALS LETTERS, 1992, 13 (01) : 35 - 39
[23] CONDUCTIVE LAYER FORMATION BY HIGH-DOSE SI ION-IMPLANTATION INTO SIO2
MIYAKE, M
KIUCHI, K
APPLIED PHYSICS LETTERS, 1985, 46 (09) : 879 - 881
[24] XPS STUDIES OF SIO2 SURFACE-LAYERS FORMED BY OXYGEN ION-IMPLANTATION INTO SILICON
SCHULZE, D
FINSTER, J
HENSEL, E
SKORUPA, W
KREISSIG, U
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 76 (01): : K21 - K24
[25] PD/SI PLASMA IMMERSION ION-IMPLANTATION FOR SELECTIVE ELECTROLESS COPPER PLATING ON SIO2
KIANG, MH
LIEBERMAN, MA
CHEUNG, NW
QIAN, XY
APPLIED PHYSICS LETTERS, 1992, 60 (22) : 2767 - 2769
[26] DEPENDENCE OF TRAP DENSITY IN SIO2 THIN-FILMS ON OXYGEN ION-IMPLANTATION DOSIS
ZUTHER, G
PRANDTKE, H
SCHMIDT, M
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1973, 20 (02): : K123 - K125
[27] STUDY OF THE CHANGES IN THE INFRARED TRANSMISSION OF SIO2 SPIN-ON-GLASS DUE TO ION-IMPLANTATION
SHACHAMDIAMAND, Y
FINKMAN, E
PINKAS, Y
MORIYA, N
APPLIED PHYSICS LETTERS, 1991, 59 (23) : 2953 - 2955
[28] ION-IMPLANTATION .2. ION-IMPLANTATION IN NONELECTRONIC MATERIALS
DEARNALEY, G
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 24-5 : 506 - 511
[29] LOW-ENERGY AND HIGH DOSE PHOSPHORUS ION-IMPLANTATION INTO SILICON THROUGH SIO2 FILM
NATSUAKI, N
TAMURA, M
TOKUYAMA, T
JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 (12) : 2427 - 2432
[30] REACTIVE ION ETCHING OF SIO2 WITH VERTICAL SIDEWALLS AND ITS APPLICATION TO ION-IMPLANTATION MASKS FOR BUBBLE-DEVICES
GOKAN, H
MUKAINARU, M
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (06): : 1620 - 1624

← 1 2 3 4 5 →