A COMPARISON OF THE THERMAL REDISTRIBUTION OF ARSENIC, ION-IMPLANTED INTO TITANIUM DISILICIDE FILMS FORMED ON SINGLE AND POLYCRYSTALLINE SILICON

被引：2

作者：

CAO, DX ^{[1
]}

REEVES, GK ^{[1
]}

HARRISON, HB ^{[1
]}

机构：

[1] GRIFFITH UNIV,DIV SCI & TECHNOL,BRISBANE 4111,AUSTRALIA

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 05期

关键词：

D O I：

10.1063/1.344320

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2208 / 2211

页数：4

共 50 条

[1] THE THERMAL REDISTRIBUTION OF ARSENIC, ION-IMPLANTED INTO TISI2 FILMS FORMED ON SINGLE AND POLYCRYSTALLINE SILICON
HARRISON, HB
CAO, DX
REEVES, GK
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C125 - C125
[2] ELECTRICAL ACTIVATION OF ARSENIC ION-IMPLANTED POLYCRYSTALLINE SILICON BY RAPID THERMAL ANNEALING
WONG, CY
KOMEM, Y
HARRISON, HB
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (03) : 146 - 148
[3] EPITAXIAL ALIGNMENT AND CRYSTALLIZATION OF ARSENIC ION-IMPLANTED POLYCRYSTALLINE SILICON FILMS ON (100) SI
WONG, CY
KOMEN, Y
HARRISON, HB
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (03) : C105 - C105
[4] ION-IMPLANTED ARSENIC IN SILICON
LARSEN, AN
CHRISTENSEN, B
CHRISTENSEN, PH
SHIRYAEV, SY
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 697 - 701
[5] THERMAL-DIFFUSION OF ION-IMPLANTED ARSENIC IN SILICON
TSUKAMOTO, K
AKASAKA, Y
KIJIMA, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (01) : 87 - 95
[6] QUANTITATIVE AUGER ANALYSIS OF ION-IMPLANTED BORON AND ARSENIC IN POLYCRYSTALLINE SILICON
FUJIWARA, K
OHTANI, M
KANAYAMA, K
OGATA, H
[J]. SURFACE SCIENCE, 1976, 61 (02) : 435 - 442
[7] PULSED LASER ANNEALING OF ION-IMPLANTED POLYCRYSTALLINE SILICON FILMS
WU, CP
MAGEE, CW
[J]. APPLIED PHYSICS LETTERS, 1979, 34 (11) : 737 - 739
[8] ELECTRICAL MEASUREMENTS ON ION-IMPLANTED LPCVD POLYCRYSTALLINE SILICON FILMS
HUANG, RS
CHENG, CH
LIU, JC
LEE, MK
CHEN, CT
[J]. SOLID-STATE ELECTRONICS, 1983, 26 (07) : 657 - 665
[9] EFFICIENCY OF DEFECT BUILDUP IN ION-IMPLANTED POLYCRYSTALLINE SILICON FILMS
DVURECHENSKII, AV
POTAPOVA, LP
KALININ, VV
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 54 (02): : 457 - 462
[10] THE ION-IMPLANTED ARSENIC TAIL IN SILICON
BECK, SE
JACCODINE, RJ
CLARK, C
[J]. ION BEAM PROCESSING OF ADVANCED ELECTRONIC MATERIALS, 1989, 147 : 73 - 78

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