THE ROLE OF SURFACE CLEANING IN THE ELLIPSOMETRIC STUDIES OF ION-IMPLANTED SILICON

被引：10
|
作者：
LOHNER, T
VALYI, G
MEZEY, G
KOTAI, E
GYULAI, J
机构：
来源：
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1981年 / 54卷 / 3-4期
关键词：
D O I：
10.1080/00337578108210055
中图分类号：
TL [原子能技术]; O571 [原子核物理学];
学科分类号：
0827 ; 082701 ;
摘要：
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页码：251 / 252
页数：2
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