CONTACT RESISTANCE TO UNDOPED AND PHOSPHORUS-DOPED HYDROGENATED AMORPHOUS-SILICON FILMS

被引：40

|

作者：

KANICKI, J

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 20期

关键词：

D O I：

10.1063/1.100330

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1943 / 1945

页数：3

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