SENSITIVITY IMPROVEMENT BY STEP-BIASING IN HOLOGRAPHIC INTERFEROMETRY

被引：2
|
作者：
ZAMBUTO, MH
HANAFY, A
机构：
[1] NEW JERSEY INST TECHNOL, ELECT ENGN DEPT, NEWARK, NJ 07102 USA
[2] L&R MFG CO, 577 ELM ST, KEARNY, NJ 07032 USA
来源：
OPTICAL ENGINEERING | 1975年 / 14卷 / 04期
关键词：
D O I：
10.1117/12.7971847
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：372 / 374
页数：3
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