SENSITIVITY IMPROVEMENT BY STEP-BIASING IN HOLOGRAPHIC INTERFEROMETRY

被引：2

作者：

ZAMBUTO, MH

HANAFY, A

机构：

[1] NEW JERSEY INST TECHNOL, ELECT ENGN DEPT, NEWARK, NJ 07102 USA

[2] L&R MFG CO, 577 ELM ST, KEARNY, NJ 07032 USA

来源：

OPTICAL ENGINEERING | 1975年 / 14卷 / 04期

关键词：

D O I：

10.1117/12.7971847

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：372 / 374

页数：3

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