HEAT-TREATMENT OF PURE SILICA GLASS STUDIED BY POSITRON-ANNIHILATION

被引：4
|
作者：
BRAUER, G
BODEN, G
机构：
来源：
APPLIED PHYSICS | 1978年 / 16卷 / 01期
关键词：
D O I：
10.1007/BF00931432
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：119 / 120
页数：2
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