HEAT-TREATMENT OF PURE SILICA GLASS STUDIED BY POSITRON-ANNIHILATION

被引:4
|
作者
BRAUER, G
BODEN, G
机构
来源
APPLIED PHYSICS | 1978年 / 16卷 / 01期
关键词
D O I
10.1007/BF00931432
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:119 / 120
页数:2
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