THIN CARBON AND BN FILMS PREPARED BY RF PLASMA DEPOSITION

被引:0
|
作者
JANCA, J
机构
关键词
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:75 / 81
页数:7
相关论文
共 50 条
  • [31] A Study of Diamond-Like Carbon Thin Films Prepared by Microwave Plasma Chemical Vapour Deposition
    赖秀琼
    陈俊芳
    符斯列
    李炜
    张茂平
    史磊
    杨春林
    Plasma Science and Technology, 2007, (04) : 444 - 447
  • [32] A study of diamond-like carbon thin films prepared by microwave plasma chemical vapour deposition
    Lai, Xiuqiong
    Chen, Junfang
    Fu, Silie
    Li, Wei
    Zhang, Maoping
    Shi, Lei
    Yang, Chunlin
    PLASMA SCIENCE & TECHNOLOGY, 2007, 9 (04) : 444 - 447
  • [33] Ni-CONTAINING CARBON FILMS PREPARED BY RF GLOW DISCHARGE DEPOSITION
    Wei Min CAO
    Kun Lin ZHOU
    Rui Hua ZHOU(Chengdu institute of Organic Chemistry
    ChineseChemicalLetters, 1994, (07) : 631 - 634
  • [34] Thin polymer films prepared by plasma immersion ion implantation and deposition
    Rangel, EC
    Silva, PAF
    Mota, RP
    Schreiner, WH
    Cruz, NC
    THIN SOLID FILMS, 2005, 473 (02) : 259 - 266
  • [35] DEPOSITION OF AMORPHOUS-CARBON FILMS BY RF PLASMA CVD METHOD
    MITOMO, T
    OHTA, T
    SASAKI, H
    OHTSUKA, K
    HABU, Y
    KAGAKU KOGAKU RONBUNSHU, 1991, 17 (02) : 305 - 312
  • [36] Cubic BN thin film deposition by a RF magnetron sputtering
    Pat, Suat
    Silik, Erbil
    Musaoglu, Caner
    Ozen, Soner
    Mohammadigharehbagh, Reza
    Yudar, H. Hakan
    Korkmaz, Sadan
    VACUUM, 2018, 157 : 31 - 35
  • [37] Effect of Nitrogen on the Growth of Carbon Nitride Thin Films Deposited by RF Plasma Enhanced Chemical Vapor Deposition
    Mishra, S. K.
    Mahanta, P.
    Sen, S.
    Pathak, L. C.
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2012, 4 (01) : 90 - 94
  • [38] Hydroxyapatite Thin Films Prepared by RF-Magnetron-Sputtered Deposition for Medical Application
    Pichugin, V. F.
    Surmenev, R. A.
    Surmeneva, M. A.
    JOURNAL OF IRON AND STEEL RESEARCH INTERNATIONAL, 2010, 17 : 113 - 121
  • [39] PHOTOELECTRON EMISSION STUDY OF HYDROGENATED AMORPHOUS-CARBON FILMS PREPARED BY RF PLASMA CHEMICAL VAPOR-DEPOSITION
    NAKAYAMA, M
    UEDA, K
    SHIBAHARA, M
    MARUYAMA, K
    KAMATA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (5B): : L924 - L926
  • [40] Deposition of carbon thin films by electron beam excited plasma
    Ban, M
    Ryoji, M
    Mori, Y
    Yanase, E
    Tokai, M
    Fujioka, J
    DIAMOND FILMS AND TECHNOLOGY, 1997, 7 (5-6): : 313 - 313