THIN CARBON AND BN FILMS PREPARED BY RF PLASMA DEPOSITION

被引：0
|
作者：
JANCA, J
机构：
来源：
ACTA PHYSICA SLOVACA | 1987年 / 37卷 / 02期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：75 / 81
页数：7
相关论文
共 50 条
  • [21] DIELECTRIC-PROPERTIES OF DIAMONDLIKE CARBON PREPARED BY RF PLASMA DEPOSITION
    LAMB, JD
    WOOLLAM, JA
    JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) : 5420 - 5423
  • [22] CARBON FILMS PREPARED BY PLASMA POLYMERIZATION OF NATURAL GAS(Ⅰ)DEPOSITION AND CHARACTERIZATION OF CARBON FILMS
    ZHOU
    Journal of Natural Gas Chemistry, 1992, (01) : 70 - 76
  • [23] Carbon nitride thin films prepared by reactive rf magnetron sputtering
    Logothetidis, S
    Lefakis, H
    Gioti, M
    CARBON, 1998, 36 (5-6) : 757 - 760
  • [24] Carbon nitride thin films prepared by reactive rf magnetron sputtering
    Logothetidis, S
    Lefakis, H
    Gioti, M
    FULLERENES AND CARBON BASED MATERIALS, 1998, 68 : 757 - 760
  • [25] Investigation of the RF plasma jet system for deposition of LiCoOx thin films
    Hubicka, Z
    Cada, M
    Jakubec, I
    Bludská, J
    Málková, Z
    Trunda, B
    Ptácek, P
    Pridal, J
    Jastrabík, L
    SURFACE & COATINGS TECHNOLOGY, 2003, 174 : 632 - 637
  • [26] PROPERTIES OF SILICON-NITRIDE FILMS PREPARED BY DUAL RF PLASMA DEPOSITION
    TSUKUNE, A
    NISHIMURA, M
    KOYAMA, K
    MAEDA, M
    YANAGIDA, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C317 - C317
  • [27] Roughness and deposition mechanism of DLC films prepared by rf plasma glow discharge
    Ali, A
    Hirakuri, KK
    Friedbacher, G
    VACUUM, 1998, 51 (03) : 363 - 368
  • [28] Atomic layer deposition of BN thin films
    Mårlid, B
    Ottosson, M
    Pettersson, U
    Larsson, K
    Carlsson, JO
    THIN SOLID FILMS, 2002, 402 (1-2) : 167 - 171
  • [29] Effects of deposition angle on synthesis of amorphous carbon nitride thin films prepared by plasma focus device
    Aghamir, F. M.
    Momen-Baghdadabad, A. R.
    Etminan, M.
    APPLIED SURFACE SCIENCE, 2019, 463 : 141 - 149
  • [30] A Study of Diamond-Like Carbon Thin Films Prepared by Microwave Plasma Chemical Vapour Deposition
    赖秀琼
    陈俊芳
    符斯列
    李炜
    张茂平
    史磊
    杨春林
    Plasma Science and Technology, 2007, 9 (04) : 444 - 447
12345