HIGH SENSITIVITY MICROWAVE GATED RADIOMETER FOR LOW TEMPERATURE PLASMA AFTERGLOW STUDIES

被引：8
|
作者：
DELPECH, JF
GAUTHIER, JC
机构：
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1971年 / 42卷 / 07期
关键词：
D O I：
10.1063/1.1685314
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：958 / +
页数：1
相关论文
共 50 条
  • [31] Low-temperature oxidation of silicon in microwave oxygen plasma
    Ray, S.K., 1600, (25):
  • [32] Mechanism of peptide modification by low-temperature microwave plasma
    Motrescu, Iuliana
    Ogino, Akihisa
    Tanaka, Shigeyasu
    Fujiwara, Taketomo
    Kodani, Shinya
    Kawagishi, Hirokazu
    Popa, Gheorghe
    Nagatsu, Masaaki
    SOFT MATTER, 2011, 7 (10) : 4845 - 4850
  • [33] Low-temperature diamond growth in a pulsed microwave plasma
    J Vac Sci Technol A, 3 pt 2 (1617):
  • [34] Low temperature oxidation of strained-Si in microwave plasma
    Bera, LK
    Ray, SK
    Banerjee, HD
    Maiti, CK
    PHYSICS OF SEMICONDUCTOR DEVICES, VOLS 1 AND 2, 1998, 3316 : 592 - 594
  • [35] LOW-TEMPERATURE OXIDATION OF SILICON IN MICROWAVE OXYGEN PLASMA
    RAY, SK
    MAITI, CK
    CHAKRABORTI, NB
    JOURNAL OF MATERIALS SCIENCE, 1990, 25 (05) : 2344 - 2348
  • [36] LOW-TEMPERATURE DIAMOND GROWTH IN A PULSED MICROWAVE PLASMA
    RING, Z
    MANTEI, TD
    THALI, S
    JACKSON, HE
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 1617 - 1618
  • [37] Low temperature thin oxide film formation by microwave excitation high density plasma direct oxidation
    Kaihara, R
    Hirayama, M
    Ohmi, T
    PROCEEDINGS OF THE INTERNATIONAL SYMPOSIUM ON THIN FILM MATERIALS, PROCESSES, RELIABILITY, AND APPLICATIONS: THIN FILM PROCESSES, 1998, 97 (30): : 223 - 230
  • [38] High-density microwave plasma for high-rate and low-temperature deposition of silicon thin film
    Sakuma, Y
    Haiping, L
    Ueyama, H
    Shirai, H
    VACUUM, 2000, 59 (01) : 266 - 276
  • [39] Low-temperature oxidation of semiconductor surfaces by use of a novel high density microwave plasma apparatus
    Gschwandtner, A.
    Lerch, W.
    ULSI PROCESS INTEGRATION 6, 2009, 25 (07): : 185 - 192
  • [40] LOW-TEMPERATURE AND HIGH-TEMPERATURE SUPERCONDUCTING MICROWAVE FILTERS
    TALISA, SH
    JANOCKO, MA
    MOSKOWITZ, C
    TALVACCHIO, J
    BILLING, JF
    BROWN, R
    BUCK, DC
    JONES, CK
    MCAVOY, BR
    WAGNER, GR
    WATT, DH
    IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1991, 39 (09) : 1448 - 1454
12345