AN INFRARED-ABSORPTION STUDY OF LTCVD SILICON DIOXIDE

被引：0

作者：

PAVELESCU, C

COBIANU, C

VANCU, A

机构：

[1] SEMICOND CCSITS,CTR RES & DEV,R-72996 BUCHAREST,ROMANIA

[2] IFTM POB MG 7,R-76900 MAGURELE BUCHARES,ROMANIA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C328 / C328

页数：1

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