AN INFRARED-ABSORPTION STUDY OF LTCVD SILICON DIOXIDE

被引：0
|
作者：
PAVELESCU, C
COBIANU, C
VANCU, A
机构：
[1] SEMICOND CCSITS,CTR RES & DEV,R-72996 BUCHAREST,ROMANIA
[2] IFTM POB MG 7,R-76900 MAGURELE BUCHARES,ROMANIA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C328 / C328
页数：1
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