STRUCTURE OF CHEMICALLY DEPOSITED POLYCRYSTALLINE-SILICON FILMS

被引：99
|
作者：
KAMINS, TI [1 ]
CASS, TR [1 ]
机构：
[1] FAIRCHILD CAMERA & INSTR CORP,RES & DEV LAB,PALO ALTO,CA 94304
来源：
THIN SOLID FILMS | 1973年 / 16卷 / 02期
关键词：
D O I：
10.1016/0040-6090(73)90164-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：147 / 165
页数：19
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