STRUCTURE OF CHEMICALLY DEPOSITED POLYCRYSTALLINE-SILICON FILMS

被引：99

作者：

KAMINS, TI ^{[1
]}

CASS, TR ^{[1
]}

机构：

[1] FAIRCHILD CAMERA & INSTR CORP,RES & DEV LAB,PALO ALTO,CA 94304

来源：

THIN SOLID FILMS | 1973年 / 16卷 / 02期

关键词：

D O I：

10.1016/0040-6090(73)90164-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：147 / 165

页数：19

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