LOW-ENERGY ELECTRON-DIFFRACTION INVESTIGATIONS OF SI MOLECULAR-BEAM EPITAXY ONTO SI(100)

被引:32
|
作者
HORN, M
GOTTER, U
HENZLER, M
机构
来源
关键词
D O I
10.1116/1.584358
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:727 / 730
页数:4
相关论文
共 50 条
  • [1] Electron diffraction on GaAs nanowhiskers grown on Si(100) and Si(111) substrates by molecular-beam epitaxy
    I. P. Soshnikov
    G. É. Cirlin
    A. A. Tonkikh
    V. N. Nevedomskiĭ
    Yu. B. Samsonenko
    V. M. Ustinov
    Physics of the Solid State, 2007, 49 : 1440 - 1445
  • [2] Electron diffraction on GaAs nanowhiskers grown on Si(100) and Si(111) substrates by molecular-beam epitaxy
    Soshnikov, I. P.
    Cirlin, G. E.
    Tonkikh, A. A.
    Nevedomskii, V. N.
    Samsonenko, Yu. B.
    Ustinov, V. M.
    PHYSICS OF THE SOLID STATE, 2007, 49 (08) : 1440 - 1445
  • [3] ON THE PERIOD OF REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION INTENSITY OSCILLATIONS DURING SI MOLECULAR-BEAM EPITAXY ON VICINAL SI(001)
    ZANDVLIET, HJW
    ELSWIJK, HB
    DIJKKAMP, D
    VANLOENEN, EJ
    DIELEMAN, J
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (05) : 2614 - 2617
  • [4] LOW-ENERGY ELECTRON-DIFFRACTION, AUGER AND ENERGY-LOSS SPECTROSCOPIC STUDY OF THE INITIAL-STAGES OF GROWTH BY MOLECULAR-BEAM EPITAXY OF GAAS ON SI(211) SUBSTRATES
    FOTIADIS, L
    KAPLAN, R
    THIN SOLID FILMS, 1990, 184 : 415 - 422
  • [5] THE USE OF PULSED LASER IRRADIATION IN SILICON MOLECULAR-BEAM EPITAXY - A COMPARATIVE LOW-ENERGY ELECTRON-DIFFRACTION STUDY
    DEJONG, T
    DOUMA, WAS
    SMIT, L
    KORABLEV, VV
    SARIS, FW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 888 - 898
  • [6] REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION AND MOLECULAR-BEAM EPITAXY
    DOBSON, PJ
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1990, (98): : 1 - 8
  • [7] LEED STUDIES OF SI MOLECULAR-BEAM EPITAXY ONTO SI(111)
    HORN, M
    HENZLER, M
    JOURNAL OF CRYSTAL GROWTH, 1987, 81 (1-4) : 428 - 433
  • [8] REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION INTENSITY OSCILLATIONS OF GERMANIUM GROWTH ON SI(100) USING GAS-SOURCE MOLECULAR-BEAM EPITAXY
    XIE, MH
    ZHANG, J
    MOKLER, SM
    FERNANDEZ, JM
    JOYCE, BA
    APPLIED PHYSICS LETTERS, 1994, 65 (24) : 3066 - 3068
  • [9] SB ADSORPTION ON SI (111) ANALYZED BY ELLIPSOMETRY AND REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION - CONSEQUENCES FOR SB DOPING IN SI MOLECULAR-BEAM EPITAXY
    ANDRIEU, S
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (03) : 1366 - 1370
  • [10] A REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION STUDY OF THE SI(111) SURFACE DURING GAS SOURCE MOLECULAR-BEAM EPITAXY
    LIU, WK
    MOKLER, SM
    OHTANI, N
    ZHANG, J
    JOYCE, BA
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (10) : 5168 - 5172