TRANSIENT ANNEALING OF SN+ IMPLANTED GAAS

被引:3
|
作者
SHAHID, MA [1 ]
BENSALEM, R [1 ]
SEALY, BJ [1 ]
FAVENNEC, PN [1 ]
GAUNEAU, M [1 ]
机构
[1] CTR NATL ETUD TELECOMMUN,F-22301 LANNION,FRANCE
关键词
D O I
10.1016/0168-583X(88)90129-2
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:531 / 539
页数:9
相关论文
共 50 条
  • [41] Photoluminescence, morphology, and structure of hydrothermal ZnO implanted at room temperature with 60 keV Sn+ ions
    Dang, Giang T.
    Kawaharamura, Toshiyuki
    Nitta, Noriko
    Hirao, Takashi
    Yoshiie, Toshimasa
    Taniwaki, Masafumi
    [J]. JOURNAL OF APPLIED PHYSICS, 2011, 109 (12)
  • [42] RAPID THERMAL ANNEALING OF SN-IMPLANTED INP
    RIDGWAY, MC
    KRINGHOJ, P
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 77 (06) : 2375 - 2379
  • [43] RAPID THERMAL ANNEALING OF ION-IMPLANTED GAAS
    SEALY, BJ
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1988, 3 (05) : 448 - 451
  • [44] INFRARED RAPID ANNEALING OF ZN-IMPLANTED GAAS
    SUZUKI, T
    SAKURAI, H
    ARAI, M
    [J]. APPLIED PHYSICS LETTERS, 1983, 43 (10) : 951 - 953
  • [45] Structural, optical and annealing studies of nitrogen implanted GaAs
    Saleem, M. S.
    Syed, W. A. A.
    Rafiq, N.
    Ahmed, S.
    Khan, M. S. A.
    J-Ur-Rehman
    [J]. PHYSICA B-CONDENSED MATTER, 2018, 544 : 47 - 51
  • [46] PULSED LASER ANNEALING OF GAAS IMPLANTED WITH SE AND SI
    RYS, A
    SHIEH, Y
    COMPAAN, A
    YAO, H
    BHAT, A
    [J]. OPTICAL ENGINEERING, 1990, 29 (04) : 329 - 338
  • [47] LASER ANNEALING EFFECTS IN ION-IMPLANTED GAAS
    NOJIMA, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (07) : 5028 - 5036
  • [48] STUDY OF ENCAPSULANTS FOR ANNEALING OF ION-IMPLANTED GAAS
    VAIDYANATHAN, KV
    HELIX, MJ
    WOLFORD, DJ
    STREETMAN, BG
    BLATTNER, RJ
    EVANS, CA
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C306 - C306
  • [49] LASER ANNEALING OF IMPLANTED GAAS - ROLE OF IMPLANTATION DEFECTS
    YAKIMKIN, VN
    USHAKOV, VV
    GIPPIUS, AA
    VAVILOV, VS
    SEDELNIKOV, AE
    DRAVIN, VA
    CHERNYAEV, VV
    PONOMAREV, NY
    [J]. SOVIET PHYSICS SEMICONDUCTORS-USSR, 1988, 22 (09): : 989 - 992
  • [50] STUDY OF ENCAPSULANTS FOR ANNEALING SI-IMPLANTED GAAS
    ONUMA, T
    HIRAO, T
    SUGAWA, T
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (04) : 837 - 840