PLASMA-ENHANCED CVD OF HIGH-QUALITY INSULATING FILMS

被引：41
|
作者：
BATEY, J
TIERNEY, E
STASIAK, J
NGUYEN, TN
机构：
来源：
APPLIED SURFACE SCIENCE | 1989年 / 39卷 / 1-4期
关键词：
D O I：
10.1016/0169-4332(89)90415-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
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页码：1 / 15
页数：15
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