CVD AND PLASMA-ENHANCED CVD OF TISI2

被引：0

作者：

KEMPER, MJH ^{[1
]}

KOO, SW ^{[1
]}

HUIZINGA, F ^{[1
]}

机构：

[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS

来源：

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C310 / C310

页数：1

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[1] MECHANISMS OF TISI2 CVD
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[J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1992, 204 : 208 - PHYS
[2] Further study on selective TiSi2 deposition by CVD
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Gayet, P
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[J]. MICROELECTRONIC ENGINEERING, 1997, 37-8 (1-4) : 435 - 440
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ENGLE, GM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04): : 733 - 737
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Spee, C. I. M. A.
Linden, J. L.
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OLMER, LJ
LORY, ER
CLAUHS, WW
HARRUS, A
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (03) : C125 - C125
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