GENERATION OF DEEP STRUCTURES BY ION-BEAM ETCHING

被引：0

作者：

DIMIGEN, H ^{[1
]}

HUBSCH, H ^{[1
]}

机构：

[1] HAMBURG GMBH,PHILIPS FORSCH LAB,VOGT KOLLN STR 300,2000 HAMBURG 54,WEST GERMANY

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C110 / C110

页数：1

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