REACTIVE GERMANIUM TRANSITION-METAL INTERFACES INVESTIGATED WITH SYNCHROTRON RADIATION PHOTOEMISSION - GE/NI AND GE/PD

被引：7
|
作者：
ABBATI, I [1 ]
ROSSI, G [1 ]
BRAICOVICH, L [1 ]
LINDAU, I [1 ]
SPICER, WE [1 ]
机构：
[1] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
来源：
APPLIED SURFACE SCIENCE | 1981年 / 9卷 / 1-4期
关键词：
D O I：
10.1016/0378-5963(81)90040-4
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：243 / 249
页数：7
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