SURFACE CONTAMINATION DETECTION BELOW THE PPB RANGE ON SILICON-WAFERS

被引：11

作者：

CORRADI, A ^{[1
]}

DOMENICI, M ^{[1
]}

GUAGLIO, A ^{[1
]}

机构：

[1] DYNAMIT NOBEL SILICON,I-28100 NOVARA,ITALY

来源：

JOURNAL OF CRYSTAL GROWTH | 1988年 / 89卷 / 01期

关键词：

D O I：

10.1016/0022-0248(88)90069-3

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：39 / 42

页数：4

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