SURFACE CONTAMINATION DETECTION BELOW THE PPB RANGE ON SILICON-WAFERS

被引：11
|
作者：
CORRADI, A [1 ]
DOMENICI, M [1 ]
GUAGLIO, A [1 ]
机构：
[1] DYNAMIT NOBEL SILICON,I-28100 NOVARA,ITALY
来源：
JOURNAL OF CRYSTAL GROWTH | 1988年 / 89卷 / 01期
关键词：
D O I：
10.1016/0022-0248(88)90069-3
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
2
引用
收藏
页码：39 / 42
页数：4
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