FORMATION OF DEFECTS IN GALLIUM-ARSENIDE ON IMPLANTATION OF PHOSPHORUS IONS AT VARIOUS TEMPERATURES

被引:0
|
作者
KOMAROV, FF
TASHLYKOV, IS
机构
来源
SOVIET PHYSICS SEMICONDUCTORS-USSR | 1977年 / 11卷 / 10期
关键词
D O I
暂无
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:1156 / 1157
页数:2
相关论文
共 50 条
  • [11] ISOMERS OF GALLIUM-ARSENIDE CLUSTER IONS
    WANG, LH
    CHIBANTE, LPF
    TITTEL, FK
    CURL, RF
    SMALLEY, RE
    [J]. CHEMICAL PHYSICS LETTERS, 1992, 194 (03) : 217 - 222
  • [12] IMPURITY-DEFECT INTERACTION IN GALLIUM-ARSENIDE DOPED BY IMPLANTATION OF TELLURIUM IONS
    ZELEVINSKAYA, VM
    KACHURIN, GA
    SMIRNOV, LS
    [J]. SOVIET PHYSICS SEMICONDUCTORS-USSR, 1973, 6 (07): : 1209 - 1210
  • [13] SHALLOW DOPING OF GALLIUM-ARSENIDE BY RECOIL IMPLANTATION
    SADANA, DK
    DESOUZA, JP
    RUTZ, RF
    CARDONE, F
    NORCOTT, MH
    [J]. ION BEAM PROCESSING OF ADVANCED ELECTRONIC MATERIALS, 1989, 147 : 315 - 320
  • [14] TRENDS IN ION-IMPLANTATION IN GALLIUM-ARSENIDE
    HARA, T
    INADA, T
    [J]. SOLID STATE TECHNOLOGY, 1979, 22 (11) : 69 - 74
  • [15] SHALLOW ION-IMPLANTATION IN GALLIUM-ARSENIDE
    GRANGE, JD
    BARTLE, DC
    BROWN, BR
    DINEEN, C
    KNIGHT, KS
    MEDLAND, JD
    WICKENDEN, DK
    DOWSETT, MG
    [J]. VACUUM, 1984, 34 (1-2) : 199 - 201
  • [16] SELENIUM IMPLANTATION IN EPITAXIAL GALLIUM-ARSENIDE LAYERS
    INADA, T
    TOKUNAGA, K
    TAKA, S
    YUGE, Y
    KOHZU, H
    [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 709 - 717
  • [17] DEFECTS AND DIFFUSION IN SILICON, GERMANIUM, AND GALLIUM-ARSENIDE
    GOESELE, UM
    TAN, TY
    [J]. JOURNAL OF METALS, 1987, 39 (07): : A6 - A6
  • [18] GAAS AND BAS ANTISITE DEFECTS IN GALLIUM-ARSENIDE
    ADDINALL, R
    NEWMAN, RC
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1992, 7 (07) : 1005 - 1007
  • [19] SPUTTERING OF GALLIUM-ARSENIDE AT ELEVATED-TEMPERATURES
    SZYMONSKI, M
    BHATTACHARYA, RS
    [J]. APPLIED PHYSICS, 1979, 20 (03): : 207 - 211
  • [20] NATURE OF DEFECTS IN N+ GALLIUM-ARSENIDE
    HUTCHINSON, PW
    DOBSON, PS
    [J]. PHILOSOPHICAL MAGAZINE, 1974, 30 (01) : 65 - 73