共 50 条
- [11] ISOMERS OF GALLIUM-ARSENIDE CLUSTER IONS [J]. CHEMICAL PHYSICS LETTERS, 1992, 194 (03) : 217 - 222
- [12] IMPURITY-DEFECT INTERACTION IN GALLIUM-ARSENIDE DOPED BY IMPLANTATION OF TELLURIUM IONS [J]. SOVIET PHYSICS SEMICONDUCTORS-USSR, 1973, 6 (07): : 1209 - 1210
- [13] SHALLOW DOPING OF GALLIUM-ARSENIDE BY RECOIL IMPLANTATION [J]. ION BEAM PROCESSING OF ADVANCED ELECTRONIC MATERIALS, 1989, 147 : 315 - 320
- [14] TRENDS IN ION-IMPLANTATION IN GALLIUM-ARSENIDE [J]. SOLID STATE TECHNOLOGY, 1979, 22 (11) : 69 - 74
- [16] SELENIUM IMPLANTATION IN EPITAXIAL GALLIUM-ARSENIDE LAYERS [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 709 - 717
- [17] DEFECTS AND DIFFUSION IN SILICON, GERMANIUM, AND GALLIUM-ARSENIDE [J]. JOURNAL OF METALS, 1987, 39 (07): : A6 - A6
- [18] GAAS AND BAS ANTISITE DEFECTS IN GALLIUM-ARSENIDE [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1992, 7 (07) : 1005 - 1007
- [19] SPUTTERING OF GALLIUM-ARSENIDE AT ELEVATED-TEMPERATURES [J]. APPLIED PHYSICS, 1979, 20 (03): : 207 - 211