DEFINED ETCHING OF CARBON-DIAMOND FILMS ON SILICON USING AN OXYGEN PLASMA WITH TITANIUM MASKING

被引：12
|
作者：
CHAN, KK [1 ]
AMARATUNGA, GAJ [1 ]
WONG, TKS [1 ]
机构：
[1] UNIV CAMBRIDGE, DEPT ENGN, CAMBRIDGE CB2 1PZ, ENGLAND
来源：
DIAMOND AND RELATED MATERIALS | 1992年 / 1卷 / 2-4期
关键词：
D O I：
10.1016/0925-9635(92)90040-U
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A technique for pattern transfer onto carbon-diamond films deposited by radio-frequency plasma-enhanced chemical vapour deposition is reported. Such a technique involves standard photolithography processes and reactive ion etching by oxygen and is compatible with present day microelectronic technology. The patterns transferred are well defined with very good resolution. © 1992.
引用
收藏
页码：281 / 284
页数：4
相关论文
共 50 条
  • [31] ALUMINUM NITRIDE AS A MASKING MATERIAL FOR THE PLASMA ETCHING OF SILICON CARBIDE STRUCTURES
    Senesky, Debbie G.
    Pisano, Albert P.
    MEMS 2010: 23RD IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 2010, : 352 - 355
  • [32] Oxygen at the interface of CVD diamond films on silicon
    Bergmaier, A
    Schreck, M
    Dollinger, G
    Schmelmer, O
    Thürer, KH
    Stritzker, B
    DIAMOND AND RELATED MATERIALS, 1999, 8 (06) : 1142 - 1147
  • [33] Improving the resistance of PECVD silicon nitride to dry etching using an oxygen plasma
    Hicks, SE
    Murad, SK
    Sturrock, I
    Wilkinson, CDW
    MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 41 - 44
  • [34] Plasma-assisted pulsed laser deposition of carbon films: Effect of oxygen plasma on amorphous carbon film etching
    Hoh, M
    Suda, Y
    Bratescu, MA
    Sakai, Y
    THIN SOLID FILMS, 2006, 506 : 96 - 100
  • [35] Optimization of etching power for surface-modified diamond films based on inductively coupled oxygen plasma
    Zhang, Kai-Liang
    Wang, Sha-Sha
    Wang, Fang
    Wu, Xiao-Guo
    Sun, Da-Zhi
    Guangdianzi Jiguang/Journal of Optoelectronics Laser, 2011, 22 (07): : 1034 - 1037
  • [36] Defect analysis and excitons diffusion in undoped homoepitaxial diamond films after polishing and oxygen plasma etching
    Volpe, Pierre-Nicolas
    Muret, Pierre
    Omnes, Franck
    Achard, Jocelyn
    Silva, Francois
    Brinza, Ovidiu
    Gicquel, Alix
    DIAMOND AND RELATED MATERIALS, 2009, 18 (10) : 1205 - 1210
  • [37] Non-symmetric magnetic mirror field ECR oxygen plasma etching CVD diamond films
    Tan B.
    Ma Z.
    Shen W.
    Wu Z.
    Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams, 2010, 22 (08): : 1887 - 1890
  • [38] REACTIVE ION ETCHING OF DIAMOND AND DIAMOND-LIKE CARBON-FILMS
    VIVENSANG, C
    TURBAN, G
    ANGER, E
    GICQUEL, A
    DIAMOND AND RELATED MATERIALS, 1994, 3 (4-6) : 645 - 649
  • [39] EROSION OF DIAMOND FILMS AND GRAPHITE IN OXYGEN PLASMA
    JOSHI, A
    NIMMAGADDA, R
    JOURNAL OF MATERIALS RESEARCH, 1991, 6 (07) : 1484 - 1490
  • [40] Etching of polycrystalline diamond films by electron beam assisted plasma
    Kobashi, K
    Miyauchi, S
    Miyata, K
    Nishimura, K
    Rocca, JJ
    JOURNAL OF MATERIALS RESEARCH, 1996, 11 (11) : 2744 - 2748
12345