FLUORINE ION IMPLANTATION PROFILES IN GALLIUM-ARSENIDE AS DETERMINED BY AUGER-ELECTRON SPECTROSCOPY

被引：7

|

作者：

HARRIS, JS

HARRIS, JM

MARCUS, HL

机构：

来源：

APPLIED PHYSICS LETTERS | 1972年 / 21卷 / 12期

关键词：

D O I：

10.1063/1.1654270

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：598 / &

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