FLUORINE ION IMPLANTATION PROFILES IN GALLIUM-ARSENIDE AS DETERMINED BY AUGER-ELECTRON SPECTROSCOPY

被引：7
|
作者：
HARRIS, JS
HARRIS, JM
MARCUS, HL
机构：
来源：
APPLIED PHYSICS LETTERS | 1972年 / 21卷 / 12期
关键词：
D O I：
10.1063/1.1654270
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：598 / &
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