INTERFACE CHARACTERISTICS OF REACTIVELY SPUTTERED AL2O3-SI STRUCTURE

被引：7
|
作者：
TANAKA, T
IWAUCHI, S
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1969年 / 8卷 / 06期
关键词：
D O I：
10.1143/JJAP.8.730
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：730 / +
页数：1
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