IMPROVED MODEL FOR TRANSPORT OF MOBILE IONS IN METAL-SILICON DIOXIDE-SILICON STRUCTURES

被引：0
|
作者：
ROEDEL, RJ
VISWANATHAN, CR
LOO, RY
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
[2] UNIV CALIF LOS ANGELES,DEPT ELECT SCI & ENGN,LOS ANGELES,CA 90024
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C294 / C294
页数：1
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