IMPROVED MODEL FOR TRANSPORT OF MOBILE IONS IN METAL-SILICON DIOXIDE-SILICON STRUCTURES

被引：0

作者：

ROEDEL, RJ

VISWANATHAN, CR

LOO, RY

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

[2] UNIV CALIF LOS ANGELES,DEPT ELECT SCI & ENGN,LOS ANGELES,CA 90024

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C294 / C294

页数：1

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