A NOVEL METHOD OF SELECTIVE EPITAXIAL-GROWTH OF INP BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：9
|
作者：
WAKAHARA, A
PAK, K
YAMADA, H
YOSHIDA, A
NAKAMURA, T
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 04期
关键词：
D O I：
10.1063/1.339682
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1284 / 1286
页数：3
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