DEPOSITION AND PROPERTIES OF TITANIUM NITRIDE FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING

被引：29
|
作者：
MENG, LJ [1 ]
AZEVEDO, A [1 ]
DOSSANTOS, MP [1 ]
机构：
[1] UNIV MINHO,DEPT GEOL,P-4719 BRAGA,PORTUGAL
来源：
VACUUM | 1995年 / 46卷 / 03期
关键词：
D O I：
10.1016/0042-207X(94)00052-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Titanium nitride films were prepared on glass substrates by dc reactive magnetron sputtering from a titanium metal target in an Ar+N-2 mixed atmosphere. During deposition, the total pressure was varied from 2x10(-3) to 3x10(-2) mbar. The effects of the total pressure on the structural, optical and electrical properties of the films were studied using X-ray diffraction, scanning electron microscopy, reflectance spectra and resistivity measurements.
引用
收藏
页码：233 / 239
页数：7
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