EPITAXIAL-GROWTH OF GAAS AND GAN BY GAS SOURCE MOLECULAR-BEAM EPITAXY USING ORGANIC GROUP-V COMPOUNDS

GaAs and GaN epilayers were grown on GaAs substrates by gas source molecular beam epitaxy technique using triethylarsine (TEAs) and diethylarsine (DEAsH) as As sources, and dimethylhydrazine (DMHy) as an N source. It was found that GaAs grows layer by layer even when organic arsine molecular sources are used. Cubic GaN was found to grow epitaxially on sufficiently nitrided surfaces of GaAs (001) substrates, in contrast with the growth of hexagonal GaN on GaAs (111) surfaces. It was also found that nitridation of GaAs surfaces does not occur when DEASH and DMHy beams are supplied onto the GaAs substrates. simultaneously. Thus. GaN/GaAs multilayers were obtained only by intermittent supply of a DEAsH beam.