GRAIN-BOUNDARY DIFFUSION OF ALUMINUM IN POLYCRYSTALLINE SILICON FILMS

被引：40
|
作者：
HWANG, JCM [1 ]
HO, PS [1 ]
LEWIS, JE [1 ]
CAMPBELL, DR [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 03期
关键词：
D O I：
10.1063/1.327811
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1576 / 1581
页数：6
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