GRAIN-BOUNDARY DIFFUSION OF ALUMINUM IN POLYCRYSTALLINE SILICON FILMS

被引：40

作者：

HWANG, JCM ^{[1
]}

HO, PS ^{[1
]}

LEWIS, JE ^{[1
]}

CAMPBELL, DR ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 03期

关键词：

D O I：

10.1063/1.327811

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1576 / 1581

页数：6

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