LITHOGRAPHY AND RADIATION-CHEMISTRY OF EPOXY CONTAINING NEGATIVE ELECTRON RESISTS

被引:61
|
作者
THOMPSON, LF [1 ]
FEIT, ED [1 ]
HEIDENRE.RD [1 ]
机构
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07914
来源
POLYMER ENGINEERING AND SCIENCE | 1974年 / 14卷 / 07期
关键词
D O I
10.1002/pen.760140713
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
引用
收藏
页码:529 / 533
页数:5
相关论文
共 50 条
  • [31] ELECTRON-SPIN-RESONANCE APPLICATION TO RADIATION-CHEMISTRY OF POLYMERS
    KASHIWABARA, H
    [J]. RADIATION PHYSICS AND CHEMISTRY, 1988, 32 (02): : 203 - 208
  • [32] APPLICATIONS OF RADIATION-CHEMISTRY IN ATMOSPHERIC CHEMISTRY
    DRAWE, H
    [J]. CHEMIKER-ZEITUNG, 1977, 101 (10): : 425 - 431
  • [33] Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography
    Lewis, Scott M.
    DeRose, Guy A.
    Alty, Hayden R.
    Hunt, Matthew S.
    Lee, Nathan
    Mann, James A.
    Grindell, Richard
    Wertheim, Alex
    De Rose, Lucia
    Fernandez, Antonio
    Muryn, Christopher A.
    Whitehead, George F. S.
    Timco, Grigore A.
    Scherer, Axel
    Winpenny, Richard E. P.
    [J]. ADVANCED FUNCTIONAL MATERIALS, 2022, 32 (32)
  • [34] RADIATION-CHEMISTRY AND THE RADIATION PRESERVATION OF FOOD
    TAUB, IA
    [J]. JOURNAL OF CHEMICAL EDUCATION, 1981, 58 (02) : 162 - 167
  • [35] RADIATION-CHEMISTRY AND THE RADIATION PRESERVATION OF FOOD
    TAUB, IA
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1980, 180 (AUG): : 37 - CHED
  • [36] RESISTS FOR ELECTRON-BEAM LITHOGRAPHY
    TAMAMURA, T
    IMAMURA, S
    SUGAWARA, S
    [J]. ACS SYMPOSIUM SERIES, 1984, 242 : 103 - 118
  • [37] RESISTS FOR ELECTRON-BEAM LITHOGRAPHY
    TAMAMURA, T
    IMAMURA, S
    SUGAWARA, S
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1983, 185 (MAR): : 32 - ORPL
  • [38] SOVIET RADIATION-CHEMISTRY TODAY
    PIKAEV, AK
    [J]. CHIMICA & L INDUSTRIA, 1980, 62 (12): : 927 - 929
  • [39] THE RADIATION-CHEMISTRY OF CRYSTALLINE ALKANES
    CHAPPAS, WJ
    SILVERMAN, J
    [J]. RADIATION PHYSICS AND CHEMISTRY, 1980, 16 (06): : 437 - 443
  • [40] Patterning of Polymer Nanocomposite Resists Containing Metal Nanoparticles by Electron Beam Lithography
    Lee, Byoung-Min
    Kang, Dong-Woo
    Jung, Chan-Hee
    Choi, Jae-Hak
    Hwang, In-Tae
    Hong, Sung-Kwon
    Lee, Jae-Suk
    [J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2011, 11 (08) : 7390 - 7393