PROTECTION OF SEMICONDUCTOR PHOTO-ANODES WITH ELECTRODEPOSITED METAL-OXIDE FILMS

被引：0
|
作者：
TENCH, D [1 ]
WARREN, LF [1 ]
机构：
[1] ROCKWELL INT,MICROELECTR RES & DEV CTR,THOUSAND OAKS,CA 91360
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C114 / C114
页数：1
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