PROTECTION OF SEMICONDUCTOR PHOTO-ANODES WITH ELECTRODEPOSITED METAL-OXIDE FILMS

被引：0

作者：

TENCH, D ^{[1
]}

WARREN, LF ^{[1
]}

机构：

[1] ROCKWELL INT,MICROELECTR RES & DEV CTR,THOUSAND OAKS,CA 91360

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C114 / C114

页数：1

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