Effect of Sulfurization Temperature on the Properties of Cu2ZnSn(S,Se)(4) Thin Films
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作者:
Yoo, Yeong Yung
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Natl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Chonnam Natl Univ, 300 Yongbong Dong, Gwangju 500757, South KoreaNatl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Yoo, Yeong Yung
[1
,2
]
Hong, Chang woo
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Chonnam Natl Univ, 300 Yongbong Dong, Gwangju 500757, South KoreaNatl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Hong, Chang woo
[2
]
Gang, Myeng Gil
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Chonnam Natl Univ, 300 Yongbong Dong, Gwangju 500757, South KoreaNatl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Gang, Myeng Gil
[2
]
Shin, Seung Wook
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Daejeon 305701, South KoreaNatl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Shin, Seung Wook
[3
]
Kim, Young baek
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Natl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South KoreaNatl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Kim, Young baek
[1
]
Moon, Jong-Ha
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Chonnam Natl Univ, 300 Yongbong Dong, Gwangju 500757, South KoreaNatl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Moon, Jong-Ha
[2
]
Lee, Yong Jeong
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Daejeon 305701, South KoreaNatl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Lee, Yong Jeong
[3
]
Kim, Jin Hyoek
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Chonnam Natl Univ, 300 Yongbong Dong, Gwangju 500757, South KoreaNatl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
Kim, Jin Hyoek
[2
]
机构:
[1] Natl Ctr Nanoproc & Equipments, Korea Inst Ind Technol, Honam Local Div, Gwangju 500480, South Korea
[2] Chonnam Natl Univ, 300 Yongbong Dong, Gwangju 500757, South Korea
[3] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Daejeon 305701, South Korea
Cu2ZnSn(S,Se) (CZTSSe) thin films were prepared by sulfurization of evaporated precursor thin films. Precursor was prepared using evaporation method at room temperature. The sulfurization was carried out in a graphite box with S powder at different temperatures. The temperatures were varied in a four step process from 520 degrees C to 580 degrees C. The effects of the sulfurization temperature on the micro-structural, morphological, and compositional properties of the CZTSSe thin films were investigated using X-ray diffraction (XRD), Raman spectra, field emission scanning electron microscopy (FE-SEM), and transmission electron microscopy (TEM). The XRD and Raman results showed that the sulfurized thin films had a single kesterite crystal CZTSSe. From the FE-SEM and TEM results, the Mo(Sx,Se-1,)(2) (MoSSe) interfacial layers of the sulfurized CZTS thin films were observed and their thickness was seen to increase with increasing sulfurization temperature. The microstructures of the CZTSSe thin films were strongly related to the sulfurization temperatures. The voids in the CZTSSe thin films increased with the increasing sulfurization temperature.
机构:
Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of TechnologyTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
李鹏宇
薛玉明
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of TechnologyTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
薛玉明
刘浩
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
Tianjin Institute of Power SourcesTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
刘浩
夏丹
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of TechnologyTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
夏丹
宋殿友
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of TechnologyTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
宋殿友
冯少君
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of TechnologyTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
冯少君
孙海涛
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of TechnologyTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
孙海涛
俞兵兵
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
Tianjin Institute of Power SourcesTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
俞兵兵
乔在祥
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Tianjin Institute of Power SourcesTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology
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E China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R ChinaE China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R China
Zhang Ke-Zhi
Tao Jia-Hua
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E China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R ChinaE China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R China
Tao Jia-Hua
Liu Jun-Feng
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E China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R ChinaE China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R China
Liu Jun-Feng
He Jun
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E China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R ChinaE China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R China
He Jun
Dong Yu-Chen
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E China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R ChinaE China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R China
Dong Yu-Chen
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Sun Lin
Yang Ping-Xiong
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E China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R ChinaE China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R China
Yang Ping-Xiong
Chu Jun-Hao
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E China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R ChinaE China Normal Univ, Dept Elect Engn, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200241, Peoples R China
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South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R ChinaSouth China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R China
Li, Jiahui
Yao, Ruohe
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South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R ChinaSouth China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R China
Yao, Ruohe
Xiong, Chao
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South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R China
Changzhou Inst Technol, Sch Photoelect Engn, Changzhou 213002, Peoples R ChinaSouth China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R China
Xiong, Chao
Liu, Yurong
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South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R ChinaSouth China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R China
Liu, Yurong
Geng, Kuiwei
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South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R ChinaSouth China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510641, Guangdong, Peoples R China
机构:
Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, TianjinTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
Li P.-Y.
Xue Y.-M.
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, TianjinTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
Xue Y.-M.
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Liu H.
Xia D.
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, TianjinTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
Xia D.
Song D.-Y.
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, TianjinTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
Song D.-Y.
Feng S.-J.
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, TianjinTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
Feng S.-J.
Sun H.-T.
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, TianjinTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
Sun H.-T.
Yu B.-B.
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Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
Tianjin Institute of Power Sources, TianjinTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
Yu B.-B.
Qiao Z.-X.
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Tianjin Institute of Power Sources, TianjinTianjin Key Laboratory of Film Electronic & Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin
机构:
Nanotechnology and MEMS Laboratory,Department of Mechanical,Industrial,and Manufacturing Engineering,The University of ToledoNanotechnology and MEMS Laboratory,Department of Mechanical,Industrial,and Manufacturing Engineering,The University of Toledo