SILICON OXIDATION IN FLUORIDE SOLUTIONS

被引：0
|
作者：
SANCIER, KM
KAPUR, V
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 08期
关键词：
D O I：
10.1149/1.2130013
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1848 / 1851
页数：4
相关论文
共 50 条
  • [21] Mechanism of anodic oxidation of tungsten in neutral sulphate-fluoride solutions
    Karastoyanov, Vassil
    Bojinov, Martin
    JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 2009, 13 (02) : 309 - 320
  • [22] An in situ second harmonic generation study of the electrochemical oxidation of silicon in fluoride media
    Hayes, P
    Taylor, AG
    Levitt, JA
    Wilde, CP
    ELECTROCHEMISTRY COMMUNICATIONS, 2003, 5 (10) : 883 - 886
  • [23] ELECTROWINNING OF SILICON FROM SOLUTIONS OF SILICA IN ALKALI-METAL FLUORIDE-ALKALINE EARTH FLUORIDE EUTECTICS
    ELWELL, D
    SOLAR ENERGY MATERIALS, 1981, 5 (02): : 205 - 210
  • [24] Chemical Oxidation of Porous Silicon in Alcohol-Lye Solutions
    Loni, A.
    Batchelor, L.
    Caffull, E.
    Canham, L. T.
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2015, 4 (05) : P149 - P151
  • [25] The properties of fluoride/glass and fluoride/silicon
    Ko, JK
    Kim, DY
    Park, JH
    Choi, SW
    Park, SH
    Yi, JS
    THIN SOLID FILMS, 2003, 427 (1-2) : 259 - 265
  • [26] Platinum electroless deposition on silicon from hydrogen fluoride solutions - Electrical properties
    Kuznetsov, GV
    Skryshevsky, VA
    Vdovenkova, TA
    Tsyganova, AI
    Gorostiza, P
    Sanz, FG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (08) : C528 - C532
  • [27] Charge exchange processes during metal deposition on silicon from fluoride solutions
    Gorostiza, P
    Díaz, R
    Sanz, F
    Morante, JR
    ELECTROCHEMICAL PROCESSING IN ULSI FABRICATION AND SEMICONDUCTOR/METAL DEPOSITION II, PROCEEDINGS, 1999, 99 (09): : 160 - 167
  • [28] Ultraviolet emission from porous silicon photosynthesized in aqueous alkali fluoride solutions
    Uchida, Kaoru
    Tomioka, Katsuhiro
    Adachi, Sadao
    JOURNAL OF APPLIED PHYSICS, 2006, 100 (01)
  • [29] Etching kinetics of silicon dioxide in aqueous fluoride solutions: A surface complexation model
    OsseoAsare, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (04) : 1339 - 1347
  • [30] Galvanic Deposition of Silver on Silicon Surfaces from Fluoride Free Aqueous Solutions
    Djokic, S. S.
    Cadien, K.
    ECS ELECTROCHEMISTRY LETTERS, 2015, 4 (06) : D11 - D13
12345