A REVIEW OF CATHODIC ARC PLASMA DEPOSITION PROCESSES AND THEIR APPLICATIONS

被引：67
|
作者：
RANDHAWA, H
JOHNSON, PC
机构：
来源：
SURFACE & COATINGS TECHNOLOGY | 1987年 / 31卷 / 04期
关键词：
D O I：
10.1016/0257-8972(87)90157-5
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：303 / 318
页数：16
相关论文
共 50 条
  • [41] Plasma deposition of tribological and optical thin film materials with a filtered cathodic arc source
    Martin, PJ
    Bendavid, A
    Netterfield, RP
    Kinder, TJ
    Jahan, F
    Smith, G
    SURFACE & COATINGS TECHNOLOGY, 1999, 112 (1-3): : 257 - 260
  • [42] Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition
    王明磊
    张林
    陆文琪
    林国强
    Plasma Science and Technology, 2023, 25 (06) : 101 - 107
  • [43] CATHODIC ARC PLASMA DEPOSITION OF TiC AND TiCxN1 - x FILMS.
    Randhawa, H.
    1600, (153):
  • [44] Single cycle plasma nitriding and hard coating deposition in a cathodic arc evaporation device
    Sanchette, F
    Damond, E
    Buvron, M
    Henry, L
    Jacquot, P
    Randall, N
    Alers, P
    SURFACE & COATINGS TECHNOLOGY, 1997, 94-5 (1-3): : 261 - 267
  • [45] Effect of deposition parameters on texture of TiN films deposited by filtered cathodic arc plasma
    Zhang, Yu-Juan
    Wu, Zhi-Guo
    Zhang, Wei-Wei
    Li, Xin
    Yan, Peng-Xun
    Liu, Wei-Min
    Xue, Qun-Ji
    Zhongguo Youse Jinshu Xuebao/Chinese Journal of Nonferrous Metals, 2004, 14 (08):
  • [46] Formation of metal oxides by cathodic arc deposition
    Anders, S
    Anders, A
    Rubin, M
    Wang, Z
    Raoux, S
    Kong, F
    Brown, IG
    SURFACE & COATINGS TECHNOLOGY, 1995, 76 (1-3): : 167 - 173
  • [47] CATHODIC ARC DEPOSITION ADVANCES COATING TECHNOLOGY
    RANDAWA, H
    JOHNSON, PC
    RESEARCH & DEVELOPMENT, 1987, 29 (02): : 173 - &
  • [48] Formation of metal oxides by cathodic arc deposition
    Univ of California, Berkeley, United States
    Surf Coat Technol, 1 -3 pt 1 (167-173):
  • [49] High-rate cathodic arc deposition
    Siemroth, P
    Schultrich, B
    Witke, T
    ISDEIV: XVIIITH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM - PROCEEDINGS, VOLS 1 AND 2, 1998, 18 : 553 - 553
  • [50] Optical emission spectroscopy in cathodic arc deposition
    Kuhn, M
    Pintaske, R
    Richter, F
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1997, 25 (04) : 694 - 699
12345