The crystalline structures of sputtered and evaporated metallic films.

被引：22
|
作者：
Kahler, H [1 ]
机构：
[1] Cornell Univ, Ithaca, NY USA
来源：
PHYSICAL REVIEW | 1921年 / 18卷 / 03期
关键词：
D O I：
10.1103/PhysRev.18.210
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：210 / 217
页数：8
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