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- [1] DETERMINATION OF BORON IN CHONDRODITE BY ION MICROPROBE MASS ANALYSISAMERICAN MINERALOGIST, 1974, 59 (9-10) : 1123 - 1126HINTHORNE, JRRIBBE, PH
- [2] ON THE DETERMINATION OF DIFFUSION COEFFICIENT OF BORON IN SILICONJOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1960, 15 (08) : 1541 - 1542YAMAGUCHI, JHORIUCHI, SMATSUMURA, KOGINO, Y
- [3] COMPARATIVE-STUDY INVOLVING ION MICROPROBE FOR MASS ANALYSIS OF BORON DOPED SILICON-CRYSTALSBULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (04): : 578 - 578LIEBERMAN, AG
- [4] CONCENTRATION PROFILES OF IMPLANTED BORON IONS IN SILICON FROM MEASUREMENTS WITH ION MICROPROBEPHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1973, 17 (02): : 653 - 658SCHWARZ, GTRAPP, MSCHIMKO, RBUTZKE, GROGGE, K
- [5] EFFECTIVE SEGREGATION COEFFICIENT OF BORON IN SILICON INGOTS GROWN BY THE CZOCHRALSKI AND BRIDGMAN TECHNIQUESJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (04) : 872 - 874RAVISHANKAR, PSHUNT, LPFRANCIS, RW
- [6] Simultaneous determination of activity coefficient and diffusion coefficient of boron in single crystalline siliconJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (05) : 1965 - 1969Fukuyama, HTakasago, JKawagishi, KSusa, MNagata, K
- [7] SEGREGATION COEFFICIENT OF BORON AND ARSENIC AT POLYCRYSTALLINE SILICON SIO2 INTERFACEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (10) : 2960 - 2964SUZUKI, KYAMASHITA, YKATAOKA, YYAMAZAKI, KKAWAMURA, K
- [8] THE SEGREGATION COEFFICIENT OF OXYGEN IN SILICONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (06) : C239 - C239JACCODINE, RJPEARCE, CW
- [9] SEGREGATION COEFFICIENT OF OXYGEN IN SILICONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C452 - C452SERIES, RWBARRACLOUGH, KG
- [10] APPLICATION OF ION MICROPROBE ANALYZER TO MEASUREMENT OF DISTRIBUTION OF BORON IONS IMPLANTED INTO SILICON CRYSTALSJOURNAL OF PHYSICS D-APPLIED PHYSICS, 1972, 5 (09) : 1654 - +GITTINS, RPDEARNALEY, GMORGAN, DV