RELATIONSHIP BETWEEN SUBSTRATE BIAS AND MICROSTRUCTURE IN MAGNETRON-SPUTTERED AL-CU FILMS

被引:18
|
作者
LIN, T
AHN, KY
HARPER, JME
MADAKSON, PB
FRYER, PM
机构
关键词
D O I
10.1016/0040-6090(87)90354-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:81 / 89
页数:9
相关论文
共 50 条
  • [31] Grain growth in magnetron-sputtered nickel films
    Wagner, T
    Müller, D
    ZEITSCHRIFT FUR METALLKUNDE, 2002, 93 (05): : 401 - 405
  • [32] Magnetron-sputtered carbon nitride (CNx) films
    Kola, P.V.
    Cameron, D.C.
    Meenan, B.J.
    Pischow, K.A.
    Anderson, C.A.
    Brown, N.M.D.
    Hashmi, M.S.J.
    Surface and Coatings Technology, 1995, 75 (1 -3 pt 2) : 696 - 703
  • [33] QUANTITATIVE AES INVESTIGATION OF MAGNETRON-SPUTTERED TI-AL-N FILMS
    SHEW, BY
    HUANG, JL
    SURFACE & COATINGS TECHNOLOGY, 1995, 73 (1-2): : 66 - 72
  • [34] Structural and mechanical properties of magnetron-sputtered Al-Au thin films
    Azadmanjiri, Jalal
    Wang, James
    Berndt, Christopher C.
    Wen, Cuie
    Srivastava, Vijay K.
    Kapoor, Ajay
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2017, 123 (01):
  • [35] Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films
    Peng, Jichang
    Li, Wenbin
    Huang, Qiushi
    Wang, Zhanshan
    SCIENTIFIC REPORTS, 2016, 6
  • [36] Constitution, microstructure, mechanical properties, and performance of magnetron-sputtered carbon films with additions of silicon
    Bauer, C
    Leiste, H
    Stüber, M
    Ulrich, S
    Holleck, H
    MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK, 2003, 34 (10-11) : 912 - 918
  • [37] Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films
    Jichang Peng
    Wenbin Li
    Qiushi Huang
    Zhanshan Wang
    Scientific Reports, 6
  • [39] Correlation between the mechanical stress and microstructure in reactive bias magnetron sputtered silicon nitride films
    Kim, JH
    Lee, WS
    Chung, KW
    THIN-FILMS - STRESSES AND MECHANICAL PROPERTIES VII, 1998, 505 : 421 - 426
  • [40] PROPERTIES OF MAGNETRON-SPUTTERED SILICON-NITRIDE FILMS
    SERIKAWA, T
    OKAMOTO, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (12) : 2928 - 2933