RELATIONSHIP BETWEEN SUBSTRATE BIAS AND MICROSTRUCTURE IN MAGNETRON-SPUTTERED AL-CU FILMS

被引：18
|
作者：
LIN, T
AHN, KY
HARPER, JME
MADAKSON, PB
FRYER, PM
机构：
来源：
THIN SOLID FILMS | 1987年 / 154卷 / 1-2期
关键词：
D O I：
10.1016/0040-6090(87)90354-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：81 / 89
页数：9
相关论文
共 50 条
  • [21] Effect of substrate bias and temperature on magnetron sputtered CrSiN films
    Tan, Shuyong
    Zhang, Xuhai
    Wu, Xiangjun
    Fang, Feng
    Jiang, Jianqing
    APPLIED SURFACE SCIENCE, 2011, 257 (06) : 1850 - 1853
  • [22] MAGNETRON-SPUTTERED TI-W FILMS
    HILL, ML
    THIN SOLID FILMS, 1980, 72 (02) : 349 - 350
  • [23] INTRINSIC STRESS OF MAGNETRON-SPUTTERED NIOBIUM FILMS
    WU, CT
    THIN SOLID FILMS, 1979, 64 (01) : 103 - 110
  • [24] Microstructure and Magnetic Properties of Magnetron-sputtered [Fe/Pt]n Multilayer Films
    Zhang, Y. M.
    Yu, W. X.
    Chen, F. H.
    Liu, M.
    Li, H. B.
    ACTA PHYSICA POLONICA A, 2015, 128 (03) : 326 - 330
  • [25] Influence of substrate bias voltage on the properties of magnetron sputtered Cu2O films
    Reddy, AS
    Rao, GV
    Uthanna, S
    Reddy, PS
    PHYSICA B-CONDENSED MATTER, 2005, 370 (1-4) : 29 - 34
  • [26] Magnetron-sputtered carbon nitride (CNx) films
    Kola, P. V.
    Cameron, D. C.
    Meenan, B. J.
    Pischow, K. A.
    Anderson, C. A.
    Brown, N. M. D.
    Hashmi, M. S. J.
    SURFACE & COATINGS TECHNOLOGY, 1995, 74-75 (1-3): : 696 - 703
  • [27] Structural and optical properties of magnetron-sputtered Er-doped AIN films grown under negative substrate bias
    Legrand, Jeremy
    Pigeat, Philippe
    Easwarakhanthan, Thomas
    Rinnert, Herve
    APPLIED SURFACE SCIENCE, 2014, 307 : 189 - 196
  • [28] Influence of Substrate Bias on the Structural and Dielectric Properties of Magnetron-Sputtered BaxSr1-xTiO3 Thin Films
    Riekkinen, Tommi
    Saijets, Jan
    Kostamo, Pasi
    Sajavaara, Timo
    Van Dijken, Sebastiaan
    FERROELECTRICS, 2009, 392 : 3 - 12
  • [29] ELECTRICAL-PROPERTIES OF SPUTTERED AL-CU FILMS
    BASHEV, VF
    DOTSENKO, FF
    MIROSHNICHENKO, IS
    FIZIKA METALLOV I METALLOVEDENIE, 1990, (11): : 201 - 202
  • [30] ELECTROMIGRATION IN SPUTTERED AL-CU THIN-FILMS
    RODBELL, KP
    SHATYNSKI, SR
    THIN SOLID FILMS, 1983, 108 (01) : 95 - 102
12345