SOFT-X-RAY PRODUCTION FROM LASER-PRODUCED PLASMAS FOR LITHOGRAPHY APPLICATIONS

被引：46
|
作者：
SPITZER, RC
KAUFFMAN, RL
ORZECHOWSKI, T
PHILLION, DW
CERJAN, C
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期
关键词：
D O I：
10.1116/1.586573
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Laser-produced plasmas are investigated as a source for soft x-ray projection lithography. The dependence of conversion efficiency on target material, intensity, wavelength, and pulse width is determined using absolutely calibrated detectors. Conversion efficiency greater than 1% into a 2.2 eV bandwidth is demonstrated for Sn targets, fulfilling the system source requirements.
引用
收藏
页码：2986 / 2989
页数：4
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